Reflectometer for thickness measurement (Smooth & translucent Thin Film Analysis)
The spectroscopic system for measuring thicknesses and thin-layer analysis allows for the determination of the thickness and the optical constants (ne K) by spectral reflectance spectrometry.
Instrumental Facilities
Film Thickness Measurement System – Model: F20e – Manufacturer: FILMETRICS
Technical characteristics
- Working spectral range 390 nm-1050 nm
- Light source: Haloxene
- SS-3 stand including fiber optics
- Measurement range: 15 nm to 70 microns
- Accuracy: 1 nm to 0.2 %
- Accuracy: 0.02 nm
- Advertisement size: 1.5 mm
- Patrón SiO2-on-Se thickness standard: 125A, 250A, 500A, 1000A, 5000A, nand 10000A (+/-10%), 6″ wafer
- The system includes the light source, the optical fiber, the sample holder and the application software ready to use in a Windows environment.
- The software allows measuring structures with several layers, or single layers on different substrates.
Applications
It allows measuring the thickness of semiconductors, optical coatings or antireflective materials, determining membrane thicknesses in smooth and translucent materials.
Sample requirements
Materials, films, substrates, coatings must be smooth and as homogeneous as possible.
More information
Carmen Serra Rodríguez – Tatiana Padín Gómez – Paula Barbazán Martín
+34 986 813 882 – Fax: 986 812 135
cserra@uvigo.es – tatiana.padin@uvigo.es – pbarbazan@uvigo.es