Dual-Beam Microscopy

The Dual Beam uses a double beam: one of electrons, to acquire typical Scanning Electron Microscopy images, and another beam of Ga + ions, which enables both the roughening of materials and their deposition. The combination of these two columns in the same equipment allows both the morphological study and the modification of the material to be analyzed. In addition to these two columns, the equipment has a gas injection system and a micromanipulator. All these systems allow the preparation of thin lamellae for Transmission Electron Microscopy studies, for example.

Thanks to the field emission electron gun, it is possible to characterize materials with high-resolution images obtained from secondary, backscattered and transmitted electrons. Crystallographic studies can also be carried out with the electron backscattered diffraction (EBSD) technique and analyses of the elemental composition of the samples using an energy dispersive system (EDS).

Another available technique is the cathodoluminescence system, which allows the analysis of the light spectrum of the radiation emitted by a material when bombarded by a beam of electrons.